本發明係關於一種製造彩色濾光板之方法,其包含以下步驟: (a)於一透明導電基板上塗佈一層正光阻劑,並使該正光阻劑層曝光以形成三種或 四種不同曝光程度之區域,其曝光量分別為D1,D2,D3,(及D4)其中D1代表恰可使該正光阻劑完全顯影之曝光量,且D1>D2>D3(>D4); (b)以一顯影液顯影及除去曝光量為D1之區域,使之裸露出透明導電基板,並以含酸 價低於70mg KOH/g之低酸價陰離子型電著樹脂之彩色電著塗料進行該區域之畫素 電著配罝; (c)以IEn之能量照射基板以使該區域達全曝光,其中IEn係Dn與Dn+1之能量差,且n定 義如下:_x000D_Methods for manufacturing color filters The invention relates to a method for manufacturing color filters utilizing a color electrodeposition coating which contains an anionic electrodeposition resin having a low acid value. Said method comprises coating a layer of positive photoresist onto a transparent electrically conductive substrate, exposing the substrate under a photomask or photo -masks to form regions of different initial levels of exposure energy, exposing the entire surface of the substrate through an energy-increment ing way to, progressively, allow all regions of the substrate to achieve an energy sufficientsufficient to completely expose the photoresist on each corresponding region, developing stepwise each region with a same developer solution to cause the electrically conductive substrate of the corresponding region uncovered, electrodepositing said region with a color electrodeposition coating contain-ing an anionic electrodeposition resin having a low acid value to finish the pixel arrangements of the desired colors and completely exposing the sub-strate. The low acid
技術摘要-中文: 本發明係關於一種製造彩色濾光板之方法,其包含以下步驟: (a)於一透明導電基板上塗佈一層正光阻劑,並使該正光阻劑層曝光以形成三種或 四種不同曝光程度之區域,其曝光量分別為D1,D2,D3,(及D4)其中D1代表恰可使該正光阻劑完全顯影之曝光量,且D1>D2>D3(>D4); (b)以一顯影液顯影及除去曝光量為D1之區域,使之裸露出透明導電基板,並以含酸 價低於70mg KOH/g之低酸價陰離子型電著樹脂之彩色電著塗料進行該區域之畫素 電著配罝; (c)以IEn之能量照射基板以使該區域達全曝光,其中IEn係Dn與Dn+1之能量差,且n定 義如下:_x000D_Methods for manufacturing color filters The invention relates to a method for manufacturing color filters utilizing a color electrodeposition coating which contains an anionic electrodeposition resin having a low acid value. Said method comprises coating a layer of positive photoresist onto a transparent electrically conductive substrate, exposing the substrate under a photomask or photo -masks to form regions of different initial levels of exposure energy, exposing the entire surface of the substrate through an energy-increment ing way to, progressively, allow all regions of the substrate to achieve an energy sufficientsufficient to completely expose the photoresist on each corresponding region, developing stepwise each region with a same developer solution to cause the electrically conductive substrate of the corresponding region uncovered, electrodepositing said region with a color electrodeposition coating contain-ing an anionic electrodeposition resin having a low acid value to finish the pixel arrangements of the desired colors and completely exposing the sub-strate. The low acid